arXiv · 1004.5353
Exploiting and engineering the optical field-enhancement in metal nanoparticle based circuits
Abstract
We study the impact of optical field-enhancement effects on the optoelectronic properties of metal nanoparticle arrays. Applying a focused ion beam lithography in combination with an electron beam deposition technique we can pattern electrical contacts in a way to give rise to an electromagnetic field-enhancement. A further field-enhancement is achieved by the plasmon resonance of the particles. Both effects are directly observed in the photoconductance of the arrays.
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Markus A. Mangold, Christoph Weiss, Beate Dirks, Alexander W. Holleitner. 2010-04-29. Exploiting and engineering the optical field-enhancement in metal nanoparticle based circuits. https://arxiv.org/abs/1004.5353
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