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arXiv · 1003.5584

Titanium Nitride Films for Ultrasensitive Microresonator Detectors

Henry G. Leduc·Bruce Bumble·Peter K. Day·Anthony D. Turner·Byeong Ho Eom·Sunil Golwala·David C. Moore·Omid Noroozian·Jonas Zmuidzinas·Jiansong Gao·Benjamin A. Mazin·Sean McHugh·Andrew Merrill
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Abstract

Titanium nitride (TiNx) films are ideal for use in superconducting microresonator detectors because: a) the critical temperature varies with composition (0 < Tc < 5 K); b) the normal-state resistivity is large, \rho_n ~ 100 $\mu$Ohm cm, facilitating efficient photon absorption and providing a large kinetic inductance and detector responsivity; and c) TiN films are very hard and mechanically robust. Resonators using reactively sputtered TiN films show remarkably low loss (Q_i > 10^7) and have noise properties similar to resonators made using other materials, while the quasiparticle lifetimes are reasonably long, 10-200 $\mu$s. TiN microresonators should therefore reach sensitivities well below 10^-19 WHz^(-1/2).

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Henry G. Leduc, Bruce Bumble, Peter K. Day, Anthony D. Turner, Byeong Ho Eom, Sunil Golwala, David C. Moore, Omid Noroozian, Jonas Zmuidzinas, Jiansong Gao, Benjamin A. Mazin, Sean McHugh, Andrew Merrill. 2010-03-29. Titanium Nitride Films for Ultrasensitive Microresonator Detectors. https://doi.org/10.1063/1.3480420

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