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arXiv · 1003.0796

In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy

H. Koop·D. Schnurbusch·M. Mueller·T. Gruendl·M. Zech·M. -C. Amann·K. Karrai·A. W. Holleitner
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Abstract

We introduce an in-situ characterization method of resists used for e-beam lithography. The technique is based on the application of an atomic force microscope which is directly mounted below the cathode of an electron-beam lithography system. We demonstrate that patterns irradiated by the e-beam can be efficiently visualized and analyzed in surface topography directly after the e-beam exposure. This in-situ analysis takes place without any development or baking steps, and gives access to the chemical (or latent) image of the irradiated resist.

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H. Koop, D. Schnurbusch, M. Mueller, T. Gruendl, M. Zech, M. -C. Amann, K. Karrai, A. W. Holleitner. 2010-03-03. In-situ direct visualization of irradiated e-beam patterns on unprocessed resists using atomic force microscopy. https://doi.org/10.1116/1.3457938

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