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arXiv · 1002.0808

Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process

Noé Curtz·Edmond Koller·Hugo Zbinden·Michel Decroux·Louis Antognazza·Øystein Fischer·Nicolas Gisin
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Abstract

Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to patterning complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high-T$_c$ superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused-ion beam, consists in locally implanting Ga^{3+} ions and/or defects instead of etching the film. This protocol could be of interest to engineer high-T$_c$ superconducting devices (SQUIDS, SIS/SIN junctions and Josephson junctions), as well as to treat other sensitive compounds.

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Noé Curtz, Edmond Koller, Hugo Zbinden, Michel Decroux, Louis Antognazza, Øystein Fischer, Nicolas Gisin. 2010-02-03. Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process. https://doi.org/10.1088/0953-2048%2F23%2F4%2F045015

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