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arXiv · 0912.0788

Deterministic tuning of slow-light in photonic-crystal waveguides through the C and L bands by atomic layer deposition

Charlton J. Chen·Chad A. Husko·Inanc Meric·Ken L. Shepard·Chee Wei Wong·William M. J. Green·Yurii A. Vlasov·Solomon Assefa
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Abstract

We demonstrate digital tuning of the slow-light regime in silicon photonic-crystal waveguides by performing atomic layer deposition of hafnium oxide. The high group-index regime was deterministically controlled (red-shift of 140 +/- 10 pm per atomic layer) without affecting the group-velocity dispersion and third-order dispersion. Additionally, differential tuning of 110 +/- 30 pm per monolayer of the slow-light TE-like and TM-like modes was observed. This passive post-fabrication process has potential applications including the tuning of chip-scale optical interconnects, as well as Raman and parametric amplification.

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Charlton J. Chen, Chad A. Husko, Inanc Meric, Ken L. Shepard, Chee Wei Wong, William M. J. Green, Yurii A. Vlasov, Solomon Assefa. 2009-12-04. Deterministic tuning of slow-light in photonic-crystal waveguides through the C and L bands by atomic layer deposition. https://doi.org/10.1063/1.3308492

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