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arXiv · 0811.3611

Nucleation of interfacial shear cracks in thin films on disordered substrates

Michael Zaiser·Paolo Moretti·Avraam Konstantinidis·Elias C Aifantis
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Abstract

We formulate a theoretical model of the shear failure of a thin film tethered to a rigid substrate. The interface between film and substrate is modeled as a cohesive layer with randomly fluctuating shear strength/fracture energy. We demonstrate that, on scales large compared with the film thickness, the internal shear stresses acting on the interface can be approximated by a second-order gradient of the shear displacement across the interface. The model is used to study one-dimensional shear cracks, for which we evaluate the stress-dependent probability of nucleation of a critical crack. This is used to determine the interfacial shear strength as a function of film geometry and statistical properties of the interface.

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Michael Zaiser, Paolo Moretti, Avraam Konstantinidis, Elias C Aifantis. 2008-11-21. Nucleation of interfacial shear cracks in thin films on disordered substrates. https://doi.org/10.1088/1742-5468/2009/02/p02047

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