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arXiv · 0804.2967

Quantum modulation of the Kondo resonance of Co adatoms on Cu/Co/Cu(100)

Takashi Uchihashi·Jianwei Zhang·Joerg Kroeger·Richard Berndt
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Abstract

Low-temperature scanning tunneling spectroscopy reveals that the Kondo temperature T_K of Co atoms adsorbed on Cu/Co/Cu(100) multilayers varies between 60 K and 134 K as the Cu film thickness decreases from 20 to 5 atomic layers. The observed change of T_K is attributed to a variation of the density of states at the Fermi level ρ_F induced by quantum well states confined to the Cu film. A model calculation based on the quantum oscillations of ρ_F at the belly and the neck of the Cu Fermi surface reproduces most of the features in the measured variation of T_K.

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Takashi Uchihashi, Jianwei Zhang, Joerg Kroeger, Richard Berndt. 2008-06-01. Quantum modulation of the Kondo resonance of Co adatoms on Cu/Co/Cu(100). https://arxiv.org/abs/0804.2967

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